We offer comprehensive & economical solutions for Nano, Thin Film and Vacuum Technology domains. Our spectrum of offerings includes Processing Systems, System Components & Consumables apart from Instruments & Equipments used for analyzing, testing, measurement & control. Our IT offerings include Interactive Teaching & Presentation Solutions and Didactic Solutions suitable for Trainings & education.
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Products
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Processing Systems
Ion Milling Systems
Plasma Etching Systems
Evaporation Systems
RF DC Sputtering Systems
PECVD Systems
PLD Systems
Ion Milling Systems
RIBE, CAIBE
- ICP sources – 14 or 20 cm beam size
- Current density up to 4 mA/cm2
- Energy range from 100 to 1000 eV
Automatic pumping unit
- Dry pump or oil rotary pump
- Turbomolecular pump with ceramic or magnetic bearings
- Cryogenic pump
Sample holder
- Tiltable substrate holder with planetary rotation and water cooling
Manual or automatic load lock
Etch finish detectors
- Laser interferometer
- SIMS
Applications
- M-RAM
- Transitional metal treatment
- Microneedles and microtips
Plasma Etching Systems
Coming Soon
Evaporation Systems
We offer Thermal Evaporation or E-Beam Evaporation HV / UHV Systems that are designed & manufactured by Plassys Bestek using high quality material. Some high lights of the system design are as follows.
- Box shape chamber with front door or Cylindrical chamber with top lid options
- Load lock with substrate treatment (plasma, ion gun, heating, oxidation…)
- Up to 6″ standardized single or multiple substrates in one go
- Resistive (Joule), electron beam or inductive sources
- Various sample holder functions: heating, water cooling, rotation and/or tilt, LN2
- Ion gun for sample preparation, etching or assisted deposition (IAD)
- Manual, Semi-Automatic & Fully automatic Control Options
Plassys can also design and make systems to suit your requirements for any specific applications. Some of the application of these thin film system are as follows.
- Lift-off processes
- HMET, PHMET transistors
- Ohmic and Schottky contacts on GaN
- IR waveguides
- Thermal barriers
- Magnetic materials for microwave applications
- MEMS encapsulation
- Josephson circuits
RF DC Sputtering Systems
We offer HV / UHV Sputtering Systems designed for Single or Multi Source to achieve various depositions. Plassys makes rugged sputtering systems that are simple in design and easy to operate. Yet, they deliver very high-quality homogeneous films with good consistency, be it an R&D unit or a production environment.
System Highlights
- Cylindrical or D Shaped chambers with top lid or front door options
- Standard chambers of 350, 400, 450, 600, 900 mm in diameter sizes
- Single-wafer load lock or cassette load lock
- Rectangular or circular Cathodes for DC, RF & Pulsed DC Sputtering
- Sputter up / down sputtering configurations
- Clusters for confocal systems & co-sputtering
- Reactive and non-reactive sputtering processes
- Static or dynamic deposition : planetary and double planetary rotation or oscillation
- RF bias on substrates prior to and during deposition
- Substrate temperature up to 1000°C
- In-situ Coating Thinness Monitoring & Controlling.
- High end Vacuum package with precise Gas Flow Controls
- Manual, Semi-Automatic & Fully automatic Control Options
Plassys can also design and make systems to suit your requirements for any specific applications. Plassys Sputtering Systems are deployed successfully in certain processes like deposition of,
- Monolayers
- Multilayers
- Magnetic layers
- Optical layers
- Co-sputtering
PECVD Systems
- PECVD
- Microwave
- Plasma
- ICP
- CCP
- Systems
PLD Systems
- e-Beam
- Thermal
- RF-DC Sputtering
- Multi-technique System
System Components
Vacuum Oil, Grease & Sealants
Wafers, Substrates & Targets
RF – DC – MW Power Supply Units
Deposition Sources
Substrate Handling
Vacuum Valves
Vacuum Pumps & Systems
Vacuum Components
Vacuum Oil, Grease & Sealants
Coming Soon ….
Wafers, Substrates & Targets
We have the following process consumables to offer. They are of well-known brands and are procured from the genuine sources. These consumables reach you with authentic quality & quantity.
Sputtering Targets
We offer High Purity Sputtering Targets, which are manufactured with utmost care, that ensures expected quality of deposited later. Standard Targets & special Targets are made & supplied according to user’s specific requirement.
Available Materials
- Metallic Targets
- Dielectric Targets: Oxides, Sulphides, Nitrides etc.
- Precious metal Targets: Gold, Platinum, Palladium, Silver, Ruthenium, etc.
- Targets of Rare earth materials, Mixtures, Compounds, etc.
Available Types
- Circular Targets of 2” ø up to 12” ø
- Rectangular Type Targets
- Cylindrical type Targets
Our principals possess expertise & proven capabilities to design & manufacture Sputtering Targets of varied materials of demanding purity in any specific shape & size for a customized specification
We also offer additional engineering services on demand
- Bonding process – Indium or Elastomer based bonding
- Cu backing plate manufacturing for any customized size
Substrates & Wafers
We offer Wafers of standard and special sizes, which can be made & supplied according to user’s requirements upon specific requests, be it a common or a special application.
Available materials
- Mono-crystalline Silicon Wafer
- Poly-crystalline Silicon Wafer
- XG Glass,
- Soda-lime Glass
- ITO coated Glass
- FTO Glass,
- Sapphire,
- GaAs etc.
We also offer additional engineering services on demand
- Dicing
- Polishing
- Oxidation &
- Metal Coating
High Purity Metals & Oxides for Deposition
We offer High Purity Metals & Oxides for Thermal & E-beam Evaporation processes.
Available Materials
- Metallic Targets
- Dielectric Targets: Oxides, Sulphides, Nitrides etc.
- Precious metal Targets: Gold, Platinum, Palladium, Silver, Ruthenium, etc.
- Targets of Rare earth materials, Mixtures, Compounds, etc.
Available Types
- Pieces
- Granules
- Powder
- Rod
- Wire
- Sheet
- Ingot
- Nano Power etc.
Our principals possess expertise & proven capabilities to design & manufacture Evaporation Materials of demanding purity in any specific shape & size for a customized specification
Vacuum Evaporation Consumables
We offer wide range of consumables for E-beam evaporation and Thermal evaporation, that include the following.
Quartz Crystal
We offer Quartz crystals that are used to estimate the thickness of the E-beam evaporation coating. We have replacement Quartz Crystals for the following equipment.
- Inficon
- Maxtek
- Sigma
- Satis
- Edwards
- Intellimetrics
- Sycon
- Filtech
- Sloan
- Ulvac
- Balzers
- Umicore
RF – DC – MW Power Supply Units
RF Power Supply, Matching Network & Accessories
We offer full range of RF Power Supplies & Accessories from Seren Industrial Power Systems, USA., who specializes in RF Generators, Impedance Matching Networks & RF Accessories for various Plasma & LASER Applications. Seren’s Rugged & Robust RF Delivery products are designed for both R&D & Industrial environments, which are CE Certified for safety & EM Radiation.
► Seren products are designed to work in standard 13.56 / 27.12 / 40.68 MHz fixed frequency and 100 kHz to 450 kHz variable frequency ranges.
► Its uniqueness lies in its in-house R&D and design capabilities to build RF PS for any size & for any specific application.
► Modular design & varied Interface options makes the task of SEREN’s integration into any system much easier.
Innovative Technology & Design Expertise combined with world class manufacturing facility enables Seren to meet & deliver the needs of most critical RF Power Solutions.
RF Power Supply, Matching Network & Accessories
| RF Generators | |||||
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RF Power |
R Series |
L
Series |
HR Series |
I / IM Series |
Features & Highlights |
|
125 W |
– | – | M 125 |
|
>125 W up to 20 kW of RF Power Output
>13.56 MHz, 27.12 MHz & 40.68 MHz – R Series >Variable Frequency – 100 kHz to 450 kHz – L Series >Programmable Pulse parameters – Pulsing / Ramping
>Front panel / Remote operation >Active / Passive Panel with Status LEDs >Forward Power / Load Power Levelling >Automatic ‘Quick Arc Handling’ for superior result
>Programmable Parameters on Display > ½ Rack & Full Rack (19″ Cabinet) Sizes > Effective Air cooled / Water cooled design › Suitable for R&D Labs & Industrial Applications
› LDMOS Technology & Complete safety inbuilt › Class AB Operation for high accuracy & stability › Special ‘I Series Generators’ for ICP Applications › Analogue / Serial / PROFIBUS / Ethernet / Device Net |
|
300 W |
R 301 | L 301 | – |
– |
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600 W |
R 601 | L 601 | HR 601 |
– |
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1000 W |
R 1001 | L 1001 | HR 1001 |
– |
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1200 W |
R 1201 | – | HR 1201 | – | |
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1600 W |
– | – | – | 1600 / 1640 | |
| 2000 W | R 2001 | L 2001 | HR 2001 |
2000 / 2027 |
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2200 W |
R 2201 | – | HR 2201 | – | |
| 3000 W | R 3001 | L 5001 | HR 3001 | ||
| 4000 W | R 4001 | – | HR 4001 |
– |
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6000 W |
R 5001 | – | HR 5001 | – | |
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6000 W |
R 6001 | – | HR 6001 | – | |
| 10000 W | R 10001 | – | HR 10001 |
– |
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| 20000 W | R 20001 | – | HR 20001 |
– |
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| Impedance Matching Network & Controller | Features & Highlights |
| ► AT & ATS Series Automatic Matching Network | › Automatic / Manual Impedance Matching
› Air / Vacuum Capacitor combination › Air cooled / Water cooled units › Multiple Input / RF / DC Ports › Variety of RF Output Options in Match Box › Wide Tuning Range – L / Inverted L Configuration › Application Specific Custom Design Matching Units |
| ► Automatic / Manual Match for all RF Power ranges | |
| ► MC2 / MCRS Match Unit Controllers | |
| ► MM Series Manual Matching Network | |
| ► Matching Transformers / Inductor Boxes |
| RF Accessories |
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Deposition Sources
We offer Spintron® range of Plasma Deposition Sources from Micro-Magnetics USA. The SpinTron® is a magnetron sputtering gun specially designed for Thin Film Applications. Micro Magnetic offers Circular Magnetrons from 2” Ø up to 6” Ø size that can accommodate a wide range of sputtering targets like Metallic, Insulating, Magnetic & Non-Magnetic target materials.
Internal magnetic configuration utilizing Circular Rare Earth NdFeB Permanent Magnet enables excellent film uniformity & target utilization. The SpinTron® is easy to install, operate, and maintain. Micro Magnetics also offers complete Sputtering Packages, which is ‘ready to fit’ to any standard flange in the deposition chamber.
Substrate Handling
Coming soon….
Vacuum Valves
Coming soon….
Vacuum Pumps & Systems
Coming soon….
Vacuum Components
Coming soon….
Test - Measure - Control
Film Thickness Measurement
Vacuum Measurement
Mass Flow Controllers
Film Thickness Measurement
Coming Soon ….
Vacuum Measurement
Coming Soon ….
Mass Flow Controllers
Mass Flow Meters & Controllers
We offer Dakota Instruments’ Mass Flow Meters (MFM) & Controllers (MFC) used in variety of Flow Control applications. Dakota’s Thermal Mass Flow Controllers are (as well as Aalborg brand) designed to be used effectively in ‘Thin Film Processing’, which allow set flow rates of gases in to the reactor/chamber.
- Dakota’s MFCs are compact, self-contained and easy to read. Models from 10 MLPM (SCCM) up to 1000 LPM of Flow Rate.
- Dakota MFC’s offer +/-1% full scale accuracy & are unaffected by temperature & pressure variations within stated limitations.
- Dakota’s MFC combines the characteristics and accuracy of conventional mass flow devices into a unique compact design.
Our Mass Flow Product range has the following
- Analogue Mass Flow Meters
- Analogue Mass Flow Controllers
- Digital Mass Flow Controllers
- Digital Control Module & Flow Totalizer
- MFM & MFC Control Cable Assemblies
IT & Didactics
Interactive Presentation Solutions
Didactic Solutions
Interactive Presentation Solutions
Coming soon….
Didactic Solutions
Coming soon……
